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Hafnium Boride Sputtering Targets (HfB2)

Hafnium Boride Sputtering Targets (HfB2)
Material Type Hafnium Boride
Symbol HfB2
Color/Appearance Dark Grey, Solid
Melting Point (°C) 3,150
Theoretical Density (g/cc) 10.50
Water Solubility Insoluble
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer
Comments  

General

Hafnium diboride is an ultrahigh temperature ceramic composed of hafnium and boron. It has a melting temperature of about 3250 degrees Celsius. It is an unusual ceramic, having relatively high thermal and electrical conductivities, properties it shares with isostructural titanium diboride and zirconium diboride. HfB2 is also quite hard and brittle. 

Material Notes

Hafnium Boride Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

 


Other Information of Hafnium Boride Sputtering Targets
 

Applications
  PVD and CVD display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

 

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 

 

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