Thin Film Substrate
Hafnium Boride Sputtering Targets (HfB2)
|Material Type||Hafnium Boride|
|Color/Appearance||Dark Grey, Solid|
|Melting Point (°C)||3,150|
|Theoretical Density (g/cc)||10.50|
|Sputter||RF, RF-R, DC|
|Type of Bond||Indium, Elastomer|
Hafnium diboride is an ultrahigh temperature ceramic composed of hafnium and boron. It has a melting temperature of about 3250 degrees Celsius. It is an unusual ceramic, having relatively high thermal and electrical conductivities, properties it shares with isostructural titanium diboride and zirconium diboride. HfB2 is also quite hard and brittle.
Hafnium Boride Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Other Information of Hafnium Boride Sputtering Targets
• Cleaning and final packaging, Cleaned for use in vacuum,
• Up to 12'' Diameter Targets Available
• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations