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Hafnium Nitride Sputtering Targets (HfN)

Hafnium Nitride Sputtering Targets (HfN)
Material Type Hafnium Nitride
Symbol HfN
Color/Appearance Yellow-Brown, Crystalline Solid
Melting Point (°C) 3,305
Theoretical Density (g/cc) 13.8
Z Ratio **1.00
Sputter RF, RF-R
Type of Bond Indium, Elastomer
Export Control (ECCN) 1C231

General

Hafnium nitride (HfNx) coatings were prepared via very high rate reactive sputtering in an Ar=N2 atmosphere over a wide range of nitrogen concentrations. The color of the coatings varied from a pale yellow at low nitrogen levels to a rich golden yellow color at the higher nitrogen levels. AEM specializes in producing high purity Hafnium Nitride Sputtering Targets with the highest possible density and smallest possible average grain sizes.

Material Notes

Hafnium Nitride Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
 



Other Information of Hafnium Nitride Sputtering Targets

Applications
  PVD (physical vapor deposition) and CVD (chemical vapor) deposition display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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