Silicon is solid at room temperature, melting at 1,414°C (2,577°F) and boiling at 3,265°C (5,909°F). It's unique because it expands when it freezes, like ice. Silicon is great at conducting heat.
Silicon sputtering targets are used in reactive magnetron sputtering to create dielectric layers like SiO2 and SiN. These layers have useful properties, like hardness, clear optics, and the ability to insulate. They also resist wear and corrosion, making them important in things like high-tech glass and microelectronics.
These sputtering targets are used in various applications, including making clear glass for LCD screens, energy-efficient architectural glass, and microelectronics. There are two types: single crystal and polycrystalline. We create flat silicon sputtering targets using a method called Czochralski crystal growth.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Silicon Sputtering Targets
• Optical and decoration coating
• Semiconductor and thin film solar energy
• Flat panel displays
Three-layer electrolytic process
• Melting and casting
Electrical resistance furnace - Semi-continuous casting
• Grain refinement
• Cleaning and final packaging - Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment
• 99.99% minimum purity
• Semiconductor grade silicon alloys available
• Smaller sizes also available for R&D applications
• Sputtering target bonding service