Films of Aluminum-doped Zinc Oxide (AZO), are transparent and electrically conductive. They have the property of high transmission in the visible region and useable transmission to IR wavelengths as long as ~12 μm. AZO materials is an ideal replacement transparent conducting oxide (TCO) for ITO for all corresponding applications. Typical applications include: transparent electrodes for solar cells, flat panel displays, LCD electrodes, electro-magnetic compatibility (RF-EMI shielding) coatings, touch panel transparent contacts, static discharge dissipation, and IR windows. A substantial cost savings is possible with AZO materials as compared to ITO and other TCOs.
The high quality of AZO sputtering targets (provided by AEM Deposition) stems from the nanostructure of our AZO powder, which enables high density sputtering targets to be produced at lower sintering temperatures, resulting in minimal grain growth. The small grains and homogeneous microstructure of the AZO sputtering targets enhance mechanical strength and improve plasma stability for a more uniform thin film deposition. The targets also have a consistent, high body density that promotes a uniform heat dispersion, resulting in longer target lifetimes and better value for money.
For those high quality AZO sputtering targets, our customer form Loughborough University, a researcher at the CREST Laboratory, commented, “These AZO targets are without doubt the easiest to use of any AZO targets we’ve worked with and consistently produce top quality thin films”.
AEM Deposition specializes in producing high purity Aluminum-doped Zinc Oxide (AZO) Sputtering Targets with the highest possible density and smallest possible average grain sizes, those AZO targets can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display, optical applications and thin film coating.
The purity of AZO Sputtering Targets provided by AEM Deposition is 99%, 99.9%, and 99.99%.
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Except any size rectangular sputtering targets, we can also provide annular sputtering targets, rotary sputtering targets or oval sputtering targets. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. Target bonding service is also provided, including Indium Metallic Bonding and Epoxy Bonding.