High Purity Materials
Thin Film Substrates
AZO Sputtering Targets (Al2O3/ZnO 2/98 wt%)
|Material Type||Alumina doped Zinc Oxide|
|Symbol||Al2O3/ZnO 2/98 wt%|
|Color/Appearance||Solid in various forms|
|Melting Point (°C)||N/A|
|Theoretical Density (g/cc)||5.56|
Max Power Density*
|Type of Bond||Indium, Elastomer|
AZO Sputtering Targets
Our standard sputtering targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations. Furthermore, threading, beveling, grooves, and backing are designed to work with both older sputtering devices and the latest process equipment. Some application examples are large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best-demonstrated techniques, including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra-high purity sputtering metallic or oxide material onto another solid substrate. This process is done by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment.
AZO Sputtering Targets Information
AZO Sputtering Targets
Purity: 99%, 99.9%, 99.99%.
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
Not only rectangular size sputtering targets, but we also provide annular sputtering targets, rotary sputtering targets, or oval sputtering targets. Materials are produced using crystallization, solid-state, and other ultra high purification processes such as sublimation. Target bonding service is also provided, including Indium Metallic Bonding and Epoxy Bonding.
Deposition Procedure of AZO Sputtering Targets
Higher power and greater thicknesses produce lower sheet resistances.
More Information on AZO Sputtering Targets
Applications• Low-E Glass Industry (Architectural glass, Automotive glass)
• Thin Film Photovoltaic Industry (TCO)
• Flat panel displays
Features• High purity and high density
• Density >= 5.55 g/cm3
• Custom sizes available
Manufacturing Process• Manufacturing - Hot pressed
Sintered, bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum,
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
Related Products of AZO Sputtering Targets
Aluminum Nitride Sputtering Target