ITO Sputtering Targets (Indium Tin Oxide)






Material Type | Indium Tin Oxide |
Symbol | In2O3/SnO2 90/10 wt %, ITO |
Melting Point (°C) | 1,800 |
Sputter | RF, DC |
Max Power Density* (Watts/Square Inch) |
20 |
Type of Bond | Indium, Elastomer |
ITO Sputtering Targets
ITO Sputtering Targets Information
Indium Tin Oxide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm;
Types: Planar sputtering targets, Rotary sputtering targets.
Target Bonding Service is recommended for these ITO targets. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
Recycle of ITO Sputtering Targets
More Information on ITO Sputtering Targets
Applications• FPD, Touch panel, Solar cells, LED• Semicoductor • Special glass, Freezer glass
• Precision optics
|
Features• High purity and high density• Custom sizes available • Good roughness of target surface and low particle • Experienced application technolohy team |
Manufacturing Process• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options• 99.99% minimum purity• Planar, Rotary, Slug avaliable • Variety composition such as 90/10,93/7,95/5,97/3,98/2 etc. |
Related Products of ITO Sputtering Targets
|
Ceramic Sputtering Targets |
|
Evaporation Materials Indium Evaporation Pellet |
Crucibles N/A |
Metal Powders Stannum Powder Tin Powder |


