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Indium Tin Oxide Sputtering Targets (ITO)

Indium Tin Oxide Sputtering Targets (ITO)
Material Type Indium Tin Oxide
Symbol In2O3/SnO2 90/10 wt %, ITO
Melting Point (°C) 1,800
Sputter RF, DC
Max Power Density*
(Watts/Square Inch)
20
Type of Bond Indium, Elastomer

General Information of ITO Sputtering Targets

Indium tin oxide (ITO, In2O3/SnO2 90/10 WT%) is a ternary composition of indium, tin and oxygen in varying proportions. Depending on the oxygen content, it can either be described as a ceramic or alloy. Indium tin oxide is typically encountered as an oxygen-saturated composition with a formulation of 74% In, 18% O2, and 8% Sn by weight. Oxygen-saturated compositions are so typical, that unsaturated compositions are termed oxygen-deficient ITO. It is transparent and colorless in thin layers, while in bulk form it is yellowish to grey. ITO is among one of the most heavily utilized compounds in the thin film industry due to its electrical conductivity and optical transparency. It is evaporated or sputtered under vacuum to generate transparent conductive layers in the manufacture of LCDs and various optical coatings. Thin films of ITO are created for the development of sensors, as well as, a glass coating for the automotive industry.

Indium Tin Oxide  (ITO) sputtering target is widely used in the formation of electrically transparent thin films, which adopt direct current magnetron sputtering process for electrodes in flat panel displays, solar cells, gas sensors and so on. In order to improve ITO thin film property, ITO sputtering target requires high purity, homogeneous microstructure, high density and high electrical conductivity. ITO sputtering targets were fabricated using In2O3-SnO2 mixed powders and tin doped indium oxide powders.

Material Notes of ITO Sputtering Targets

Purity: 99.99%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Types: Planar sputtering targets, Rotary sputtering targets

Target Bonding Service is recommended for these ITO targets. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.
This ITO sputtering target may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock. 

Recycle of ITO Sputtering Targets

The remaining material is unusable in the sputtering process. In the case of an ITO sputtering target, the unused portion can represent a significant amount of indium. It makes sense to reclaim or recycle as much of the target as possible. The target user will break up the remaining target in to chunks. The chunk ITO is sent to a recycling/reclaim center where the chunk ITO is converted back in to indium metal. And the cycle starts all over again.

Other Information of ITO Sputtering Targets


Applications
 TP/TN/STN/TFT-LCD
• Semicoductor

• Special glass, Freezer glass

• Precision optics
 

 

Features
• High purity
• Custom Sizes Available

• Good roughness of target surface and low particle

Manufacturing Process
• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
99.9% Minimum Purity

• Planar, rotary, Slug avaliable

• Variety composition such as 90/10,93/7,95/5,97/3,98/2 etc.

 
 

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