Indium Zinc Oxide Sputtering Targets (IZO)
| Material Type | Indium Zinc Oxide |
| Symbol | In2O3/ZnO 90/10 wt %, IZO |
| Melting Point (°C) | 1,900 - 1,920 |
| Sputter | RF, DC |
|
Max Power Density* (Watts/Square Inch) |
20 |
| Type of Bond | Indium, Elastomer |
Indium Zinc Oxide Sputtering Targets
The IZO ceramic target (99.99% in purity and density) comprises 90 wt.% of ln2O3 and 10 wt.% of ZnO. The direct current (dc) magnetron sputtering system is utilized for the film deposition. Without/with the ion-assisted deposition (IAD) technique, the electrical, optical, and structural properties of these films prepared by different dc powers (such as 50 W, 80 W, and 100 W) are an optimal IZO deposition condition which is developed for flexible organic light-emitting device (OLED) applications.
Indium Zinc Oxide Sputtering Targets Information
Indium Zinc Oxide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
More Information on Indium Zinc Oxide Sputtering Targets
Applications• Transparent conductive film• Physical vapor deposition
• Chemical vapor deposition
|
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.99% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
|
Related Products of Indium Zinc Oxide Sputtering Targets
|
Ceramic Sputtering Targets |
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|
Evaporation Materials |
Crucibles N/A |
Metal Powders Zinc Powder |
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