86-0731-89578196
[email protected]
- Home
- Our Company
-
Products
Sputtering Targets
- Industries
- Equipment
- FAQ
- Contact Us
Hafnium Oxide Sputtering Target Video
HfO2 Sputtering Target https://www.aemdeposition.com/oxide-targets/hafnium-oxide-sputtering-targets.html
Details as follows:
HfO2 Sputtering Target
Brand: AEM Deposition
Purity: 99.95%
Size: Φ2'' x 0.25''
Applications
- Ferroelectric
- Gate Dielectric
- For CMOS
Related products:
Pure metal sputtering targets https://www.aemdeposition.com/pure-metal-targets/
Alloy sputtering targets https://www.aemdeposition.com/alloy-targets/
Oxide sputtering targets https://www.aemdeposition.com/oxide-targets/
Sulfide sputtering targets https://www.aemdeposition.com/sulfide-targets/
Selenide sputtering targets https://www.aemdeposition.com/selenide-targets/
Boride sputtering targets https://www.aemdeposition.com/boride-targets/
Carbide sputtering targets https://www.aemdeposition.com/carbide-targets/
Silicide sputtering targets https://www.aemdeposition.com/silicide-targets/
Telluride sputtering targets https://www.aemdeposition.com/telluride-targets/
Nitride sputtering targets https://www.aemdeposition.com/nitride-targets/
Fluoride sputtering targets https://www.aemdeposition.com/fluoride-targets/
Follow us:
Twitter: https://twitter.com/aemdeposition
LATEST NEWS