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Home > News & Events > Sputtering Targets News > Li1.5(Ni0.6Co0.2Mn0.2)O2 Sputtering Target Video
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    Li1.5(Ni0.6Co0.2Mn0.2)O2 Sputtering Target Video

    Li1.5(Ni0.6Co0.2Mn0.2)O2 Sputtering Target https://www.aemdeposition.com/oxide-targets/lithium-nickel-manganese-cobalt-oxide-sputtering-target.html
    Details as follows:
    Li1.5(Ni0.6Co0.2Mn0.2)O2 Sputter Target
    Brand: AEM Deposition
    Purity: 3N 99.9%
    Size: Φ50.8 x 3.2/3 mm
     
    Applications
    - Semiconductor
    - Chemical vapor deposition (CVD) 
    - Physical vapor deposition (PVD) 
    - Display and optical applications
     
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