Li1.5(Ni0.6Co0.2Mn0.2)O2 Sputtering Target Video
Details are as follows:
Li1.5(Ni0.6Co0.2Mn0.2)O2 Sputter Target
Brand: AEM Deposition
Purity: 3N 99.9%
Size: Φ50.8 x 3.2/3 mm
Applications
- Semiconductor
- Chemical vapor deposition (CVD)
- Physical vapor deposition (PVD)
- Display and optical applications
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