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Bismuth Oxide Sputtering Targets (Bi2O3)

Bismuth Oxide Sputtering Targets (Bi2O3)
Material Type Bismuth Oxide
Symbol Bi2O3
Color/Appearance Yellow, Crystalline Solid
Melting Point (°C) 860
Theoretical Density (g/cc) 8.55
Z Ratio **1.00
Sputter RF, RF-R
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer


Bismuth(III) oxide is perhaps the most industrially important compound of bismuth. It is also a common starting point for bismuth chemistry. It is found naturally as the mineral bismite (monoclinic) and sphaerobismoite (tetragonal, much more rare), but it is usually obtained as a by-product of the smelting of copper and lead ores. Bismuth trioxide is commonly used to produce the "Dragon's eggs" effect in fireworks, as a replacement of red lead.

Material Notes

Bismuth Oxide Sputtering Targets, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. The ratings are based on unbonded targets and are material specific. Bonded targets should be run at lower powers to prevent bonding failures. Bonded targets should be run at 20 Watts/Square Inch or lower, depending on the material.

Other Information of Bismuth Oxide Sputtering Targets

• Gate Dielectric

• For CMOS

• Non-volatile Memory
• Thin film capacitor


• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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