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Cobalt Oxide Sputtering Targets(CoO)

Cobalt Oxide Sputtering Targets(CoO)
Material Type Cobalt Oxide
Symbol CoO
Color/Appearance Gray or Olive Green, Crystalline Solid
Melting Point (°C) 1,795
Theoretical Density (g/cc) 6.45
Z Ratio 0.412
Sputter DC-R, RF-R
Max Power Density*
(Watts/Square Inch)
18
Type of Bond Indium, Elastomer
Comments Sputtering preferred.

General

Material Notes

Cobalt Oxide Sputtering Targets, Purity is 99.9%;Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 


Other Information of Cobalt Oxide Sputtering Targets

Applications
  Ferroelectric
• Gate Dielectric

• For CMOS

• Non-volatile Memory
• Thin film capacitor

 

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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