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Cobalt Sputtering Targets (Co)

Cobalt Sputtering Targets (Co)
Material Type Cobalt
Symbol Co
Atomic Weight 58.933195
Atomic Number 27
Color/Appearance Lustrous, Metallic, Grayish Tinge
Thermal Conductivity 100 W/m.K
Melting Point (°C) 1,495
Coefficient of Thermal Expansion 13.0 x 10-6/K
Theoretical Density (g/cc) 8.9
Ferromagnetic Magnetic Material
Z Ratio 0.343
Sputter DC
Max Power Density*
(Watts/Square Inch)
80
Comments Alloys with W/Ta/Mo.

General

Cobalt is a brittle, hard metal, resembling iron and nickel in appearance. The free element, produced by reductive smelting, is a hard, lustrous, silver-gray metal. The cobalt sputtering targets are common used in information storage industry. The related film products prepared using sputtering targets include hard disks, magnetic heads, optical disks, etc. Cobalt-based alloy targets are widely used in cutting-edge scientific fields such as inverter components and switching power supplies. Cobalt alloy targets can also be used for magnetic materials for data storage tapes. Typical materials are Co-Fe, Co-Fe-Ta-Zr, Co-Ni, Co-Ni-Cr, Co-Cr, Co-Cr-Ta sputtering targets. AEM can provide various Cobalt alloy sputtering targets as you requested.

Material Notes

Purity: 99.95%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target


Other Information of Cobalt Sputtering Targets

Applications
Electronics
• 
Information storage
• Flat panel displays
Features
Competitive pricing
• High purity
• Grain refined, engineered microstructure (average grain size < 100 um)
• Semiconductor grade

Manufacturing Process
• Melting
  Electrical resistance furnace - Semi-continuous casting (VIM)

Analysis (GDMS, ICP-OES, LECO)
• Grain refinement
  Thermomechanical treatment
(Forging, Rolling, Annealing)
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
Options
99.95% minimum purity
Cobalt alloy targets
Co-Fe, Co-Ni, Co-Fe-Ta-Zr, Co-Ta-Zr
• Semiconductor grade cobalt compound targets
LaxSr1-xCoyFe1-yO3, CoFe2O4, MnCo2O4, LiNi(1-x)CoxO2, La0.5Sr0.5CoO3, LiCoO2, Co3O4, CoO, Sm/Co5
• Sputtering target bonding service
 
 

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