Cobalt Sputtering Targets (Co)
| Material Type | Cobalt |
| Symbol | Co |
| Atomic Weight | 58.933195 |
| Atomic Number | 27 |
| Color/Appearance | Lustrous, Metallic, Grayish Tinge |
| Thermal Conductivity | 100 W/m.K |
| Melting Point (°C) | 1,495 |
| Coefficient of Thermal Expansion | 13.0 x 10-6/K |
| Theoretical Density (g/cc) | 8.9 |
| Ferromagnetic | Magnetic Material |
| Z Ratio | 0.343 |
| Sputter | DC |
|
Max Power Density* (Watts/Square Inch) |
80 |
| Comments | Alloys with W/Ta/Mo. |
Cobalt Sputtering Targets
Cobalt is a brittle, hard metal, resembling Iron and Nickel in appearance. The free element, produced by reductive smelting, is a hard, lustrous, silver-gray metal. The cobalt sputtering targets are mostly used in the information storage industry. The related film products prepared using sputtering targets include hard disks, magnetic heads, optical disks, and many others. Cobalt-based alloy targets are widely used in cutting-edge scientific fields such as inverter components and switching power supplies. Cobalt alloy targets can also be used for magnetic materials for data storage tapes. Typical materials are Co-Fe, Co-Fe-Ta-Zr, Co-Ni, Co-Ni-Cr, Co-Cr, Co-Cr-Ta sputtering targets. AEM offers various Cobalt alloy sputtering targets as per requirement.
Cobalt Sputtering Targets Information
Cobalt Sputtering Targets
Purity: 99.95%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm;
Targets Type: Planar sputtering target, Rotary sputtering target.
More Information on Cobalt Sputtering Targets
Applications• Electronics• Information storage • Flat panel displays |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure (average grain size < 100 um) • Semiconductor grade |
Manufacturing Process• MeltingElectrical resistance furnace - Semi-continuous casting (VIM) • Analysis (GDMS, ICP-OES, LECO) • Grain refinement Thermomechanical treatment (Forging, Rolling, Annealing) • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options
• 99.95% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Cobalt Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials Cobalt Pellet Evaporation Material |
Crucibles N/A |
Metal Powders |
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