Strontium Bismuth Tantalate Sputtering Targets (SBT (Sr0.8Bi2.2Ta2O9))
| Material Type | Strontium Bismuth Tantalate |
| Symbol | SBT (Sr0.8Bi2.2Ta2O9) |
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Strontium Bismuth Tantalate Sputtering Targets
Using BiTaO4 as the precursor, ferroelectric strontium bismuth tantalate SrBi2Ta2O9 is successfully synthesized. Heating the mixtures of BiTaO4 and SrCO3 at 800 °C results in the entire formation of a single-phase SrBi2Ta2O9.
Strontium Bismuth Tantalate Sputtering Targets Information
Strontium Bismuth Tantalate Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Strontium Bismuth Tantalate Sputtering Targets
Applications• Ferroelectric• Thin film capacitors • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Strontium Bismuth Tantalate Sputtering Targets
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N/A
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Ceramic Sputtering Targets |
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Evaporation Materials Strontium Pellet |
Crucibles N/A |
Metal Powders N/A |
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