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Strontium Bismuth Niobate Sputtering Targets (SBN (SrBi2Nb2O9))

Strontium Bismuth Niobate Sputtering Targets (SBN (SrBi2Nb2O9))
Material Type Strontium Bismuth Niobate
Symbol SBN (SrBi2Nb2O9)
Melting Point (°C)  
Relative Density (g/cc  
Water Solubility  
Type of Bond  


Strontium bismuth niobate vanadates, SrBi2 (VxNb1-x)2O9 (with 0 ≤ x ≤ 0.1), were prepared by reaction sintering of powder mixtures of constituent oxides. In recent years the microwave sintering has been utilized for the synthesis of materials in enhancement of the properties. In this paper strontium bismuth niobate(Sr0.8Bi2.2Nb2O9:SBN) bulk ceramic has been synthesized by microwave reactive sintering and conventional heating techniques. A relative density of 99.6% has been achieved for microwave sintered SBN, which is higher than that of (98.81%) conventionally sintered SBN. The phase formation of SBN synthesized by both processes has been confirmed by X-ray diffraction (XRD). 

Material Notes

Strontium Bismuth Niobate Sputtering Target, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.


Other Information of Strontium Bismuth Niobate Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

• 99.9% ex Strontium Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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