Home > Sputtering Targets > Ceramic Oxide Sputtering Targets > Strontium Bismuth Niobate Sputtering Targets (SBN (SrBi2Nb2O9))

Strontium Bismuth Niobate Sputtering Targets (SBN (SrBi2Nb2O9))

Material Type	Strontium Bismuth Niobate
Symbol	SBN (SrBi2Nb2O9)
Color/Appearance
Melting Point (°C)

Relative Density (g/cc
Water Solubility
Sputter
Type of Bond
Comments

Strontium Bismuth Niobate Sputtering Targets

Strontium bismuth niobate vanadates, SrBi2 (VxNb1-x)2O9 (with 0 ≤ x ≤ 0.1), were prepared by reaction sintering of powder mixtures of constituent oxides. In recent years the microwave sintering has been utilized for the synthesis of materials in the enhancement of the properties. Strontium bismuth niobate(Sr0.8Bi2.2Nb2O9:SBN) bulk ceramic has been synthesized by microwave reactive sintering and conventional heating techniques. A relative density of 99.6% has been achieved for microwave sintered SBN, which is higher than that of (98.81%) conventionally sintered SBN. The phase formation of SBN synthesized by both processes has been confirmed by X-ray diffraction (XRD).

Strontium Bismuth Niobate Sputtering Targets Information

Strontium Bismuth Niobate Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.

More Information on Strontium Bismuth Niobate Sputtering Targets

Applications

• Ferroelectric
• Gate Dielectric

• For CMOS

Features

• High purity
• Custom sizes available

Manufacturing Process

• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options

• 99.9% minimum purity

• Smaller sizes also available for R&D applications

• Sputtering target bonding service

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