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Iron Silicide Sputtering Targets (FeSi2)

Iron Silicide Sputtering Targets (FeSi2)
Material Type Iron Silicide
Symbol FeSi2
Color/Appearance Dark Grey, Solid
Melting Point (°C) 1,220
Theoretical Density (g/cc) 4.57
Water Solubility Insoluble
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer


AEM specializes in producing high purity Iron Silicide Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in applications.

Material Notes

Iron Silicide Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

Other Information of Iron Silicide Sputtering Targets

  PVD and CVD display
• Semiconductor

• Optical

• High purity
• Custom Sizes Available


Manufacturing Process
• Manufacturing - Melting - Sintered

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations



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