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Iron Silicide Sputtering Targets (FeSi2)

Material Type	Iron Silicide
Symbol	FeSi₂
Color/Appearance	Dark Grey, Solid
Melting Point (°C)	1,220

Theoretical Density (g/cc)	4.57
Water Solubility	Insoluble
Sputter	RF, RF-R, DC
Type of Bond	Indium, Elastomer
Comments

Iron Silicide Sputtering Targets

AEM is specialized in producing high purity Iron Silicide Sputtering Targets with the highest possible density and smallest possible average grain sizes to use in applications.

Iron Silicide Sputtering Targets Information

Iron Silicide Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.

More Information on Iron Silicide Sputtering Targets

Applications

• Chemical Vapor Deposition (CVD)
• Physical Vapor Deposition (PVD)
• Semiconductor

• Optical

Features

• High purity
• Custom sizes available

Manufacturing Process

• Manufacturing - Melting - Sintered

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options

• 99.5% minimum purity

• Smaller sizes also available for R&D applications

• Sputtering target bonding service

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