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Iron Silicide Sputtering Targets (FeSi2)

Iron Silicide Sputtering Targets (FeSi2)
Material Type Iron Silicide
Symbol FeSi2
Color/Appearance Dark Grey, Solid
Melting Point (°C) 1,220
Theoretical Density (g/cc) 4.57
Water Solubility Insoluble
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer
Comments  

General

AEM specializes in producing high purity Iron Silicide Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in applications.

Material Notes

Iron Silicide Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 



Other Information of Iron Silicide Sputtering Targets
 

Applications
  PVD and CVD display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

 

Manufacturing Process
• Manufacturing - Melting - Sintered

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 

 

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