Molybdenum Disilicide Sputtering Targets (MoSi2)
Material Type | Molybdenum Silicide |
Symbol | MoSi2 |
Melting Point (°C) | 2,050 |
Theoretical Density (g/cc) | 6.31 |
Z Ratio | **1.00 |
Sputter | RF |
Type of Bond | Indium, Elastomer |
Comments | Decomposes. |
Molybdenum Disilicide Sputtering Targets
Molybdenum disilicide (MoSi2, or molybdenum silicide) is an intermetallic compound, a silicide of molybdenum. It is a refractory ceramic with primary use in heating elements. It has moderate density, a melting point of 2030°C, and is electrically conductive. At high temperatures, it forms a passivation layer of silicon dioxide, protecting it from further oxidation. It is a gray metallic-looking material with a tetragonal crystal structure. Its beta-modification is hexagonal and unstable. It is insoluble in most acids but soluble in nitric acid and hydrofluoric acid.
Molybdenum Disilicide Sputtering Targets Information
Molybdenum Disilicide Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Molybdenum Disilicide Sputtering Targets
Applications• Chemical Vapor Deposition (CVD)• Physical Vapor Deposition (PVD) • Semiconductor • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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