Chromium Silicide Sputtering Targets (CrSi2)
| Material Type | Chromium Silicide |
| Symbol | CrSi2 |
| Melting Point (°C) | 1,490 |
| Theoretical Density (g/cc) | 5.5 |
| Sputter | RF |
| Type of Bond | Indium, Elastomer |
Chromium Silicide Sputtering Targets
Chromium(II) silicide is an inorganic compound with the chemical formula CrSi2. Chromium(II) Silicide is generally immediately available in most volumes. High purity, submicron, and nanopowder forms may be considered mostly. AEM offers many standard grades if required.
Chromium Silicide Sputtering Targets Information
Chromium Silicide Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Chromium Silicide Sputtering Targets
Applications
• Chemical Vapor Deposition (CVD) • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Chromium Silicide Sputtering Targets
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Ceramic Sputtering Targets Chromium Oxide Sputtering Target |
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Evaporation Materials Chromium Evaporation Pellet |
Crucibles N/A |
Metal Powders Chromium Powder |
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