Thin Film Substrate
Chromium Silicide Sputtering Targets (CrSi2)
|Material Type||Chromium Silicide|
|Melting Point (°C)||1,490|
|Theoretical Density (g/cc)||5.5|
|Type of Bond||Indium, Elastomer|
Chromium(II) silicide is an inorganic compound with the chemical formula CrSi2. is generally immediately available in most volumes. High purity, submicron and nanopowder forms may be considered. AEM produces to many standard grades when applicable.
Chromium Silicide Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Other Information of Chromium Silicide Sputtering Targets
• Cleaning and final packaging, Cleaned for use in vacuum,
• Up to 12'' Diameter Targets Available
• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations