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Chromium Silicide Sputtering Targets (CrSi2)

Chromium Silicide Sputtering Targets (CrSi2)
Material Type Chromium Silicide
Symbol CrSi2
Melting Point (°C) 1,490
Theoretical Density (g/cc) 5.5
Sputter RF
Type of Bond Indium, Elastomer

General

Chromium(II) silicide is an inorganic compound with the chemical formula CrSi2. Chromium(II) Silicide is generally immediately available in most volumes. High purity, submicron and nanopowder forms may be considered. AEM produces to many standard grades when applicable.

Material Notes

Chromium Silicide Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 



Other Information of Chromium Silicide Sputtering Targets
 

Applications
  PVD and CVD display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

 

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 

 

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