Niobium Nitride Sputtering Targets (NbN)
Material Type | Niobium Nitride |
Symbol | NbN |
Color/Appearance | Gray, Crystalline Solid |
Melting Point (°C) | 2,573 |
Theoretical Density (g/cc) | 8.4 |
Z Ratio | 1.00 |
Sputter | RF, RF-R |
Type of Bond | Indium, Elastomer |
Comments | Reactive. Evaporates Nb in 10-3Torr N2. |
Niobium Nitride Sputtering Targets
Niobium Nitride Sputtering Targets Information
Niobium Nitride Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Niobium Nitride Sputtering Targets
Applications• Chemical Vapor Deposition (CVD)• Physical Vapor Deposition (PVD) • Semiconductor • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Niobium Nitride Sputtering Targets
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Ceramic Sputtering Targets Niobium Oxide Sputtering Target |
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Evaporation Materials Niobium Evaporation Pellet |
Crucibles N/A |
Metal Powders Niobium Powder |