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Boron Nitride Sputtering Targets (BN)

Boron Nitride Sputtering Targets (BN)
Material Type Boron Nitride
Symbol BN
Color/Appearance White, Crystalline Solid
Melting Point (°C) 2,973
Theoretical Density (g/cc) 2.25
Sputter RF, RF-R
Max Power Density*
(Watts/Square Inch)
20
Type of Bond Indium, Elastomer
Comments Decomposes when sputtered. Reactive preferred.

General

Boron nitride is a heat- and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN. It exists in various crystalline forms that are isoelectronic to a similarly structured carbon lattice. The hexagonal form corresponding to graphite is the most stable and soft among BN polymorphs, and is therefore used as a lubricant and an additive to cosmetic products.

Material Notes

Boron Nitride Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

 


Other Information of Boron Nitride Sputtering Targets

Applications
  PVD (physical vapor deposition) and CVD (chemical vapor) deposition display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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