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Chromium Nitride Sputtering Targets (CrN)

Chromium Nitride Sputtering Targets (CrN)
Material Type Chromium Nitride
Symbol CrN, Cr2N
Color/Appearance Dark Grey, Solid
Melting Point (°C) N/A CrN, 1,800 Cr2N
Theoretical Density (g/cc) 5.90 CrN, 6.51 Cr2N
Water Solubility Insoluble
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer
Comments  

General

Chromium nitride is a chemical compound of chromium and nitrogen with the formula CrN. It is very hard, and is extremely resistant to corrosion. It is an interstitial compound, with nitrogen atoms occupying the octahedral holes in the chromium lattice, it is not strictly a chromium(III) compound nor does it contain nitride ions (N3-). Chromium forms a second interstitial nitride, dichromium nitride, Cr2N.

Material Notes

Chromium Nitride Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 



Other Information of Chromium Nitride Sputtering Targets

Applications
  PVD (physical vapor deposition) and CVD (chemical vapor) deposition display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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