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AEM Deposition

Barium Carbonate Sputtering Targets (BaCO3)

Barium Carbonate Sputtering Targets (BaCO3)
Barium Carbonate Sputtering Targets (BaCO3)
Material Type Barium Carbonate
Symbol BaCO3
Melting Point (°C) 811
Theoretical Density (g/cc) 4.29
Z Ratio  
Sputter RF, DC
Max Power Density*
(Watts/Square Inch)
Type of Bond Elastomer, Indium


Material Notes

Barium Carbonate Sputtering Targets, Purity is 99.9%;Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

Other Information of Barium Carbonate Sputtering Targets

• Gate Dielectric

• For CMOS



• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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