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Barium Sputtering Targets (Ba)

Barium Sputtering Targets (Ba)
Material Type Barium
Symbol Ba
Atomic Weight 137.327
Atomic Number 56
Color/Appearance Silvery White, Metallic
Thermal Conductivity 18 W/m.K
Melting Point (°C) 725
Coefficient of Thermal Expansion 20.6 x 10-6/K
Theoretical Density (g/cc) 3.5
Z Ratio 2.1
Sputter RF
UN Number 1400
Comments Wets without alloying, reacts with ceramics.  Not recommended for sputtering.


Barium is a chemical element with symbol Ba and atomic number 56. It is the fifth element in Group 2, a soft silvery metallic alkaline. Because of its high chemical reactivity, barium is never found in nature as a free element. Its hydroxide, known in pre-modern history as baryta, does not occur as a mineral, but can be prepared by heating barium carbonate. he most common naturally occurring minerals of barium are barite (barium sulfate, BaSO4) and witherite (barium carbonate, BaCO3), both insoluble in water.

Material Notes

Barium Sputtering Targets, Purity is 99.5%; Circular: Diameter ? 14inch, Thickness ? 1mm; Block: Length ? 32inch, Width ? 12inch, Thickness ? 1mm.

Other Infomation of Barium Sputtering Targets


• Electronics

• Semiconductor

• Flat panel displays


• Competitive pricing

• High purity

• Grain refined, engineered microstructure

• Semiconductor grade

Manufacturing Process:

• Refining, Three-layer electrolytic process

• Melting and casting, Electrical resistance furnace - Semi-continuous casting

• Grain refinement, Thermomechanical treatment

• Cleaning and final packaging - Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment


• 99.999% minimum purity

• Semiconductor grade aluminum alloys available

• Planar circular targets up to 18'' (457mm) diameter

• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations

• Smaller sizes also available for R&D applications

• Sputtering target bonding service

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