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AEM Deposition

Barium Titanate Sputtering Targets (BaTiO3)

Barium Titanate Sputtering Targets (BaTiO3)
Barium Titanate Sputtering Targets (BaTiO3)
Material Type Barium Titanate
Symbol BaTiO3
Melting Point (°C) 1,625
Theoretical Density (g/cc) 6.02
Z Ratio 0.464
Sputter RF, DC
Max Power Density*
(Watts/Square Inch)
Type of Bond Elastomer
Comments Gives Ba. Co-evap and Sputter OK.


Barium titanate is the inorganic compound with the chemical formula BaTiO3. Barium titanate is a white powder and transparent as larger crystals. This titanate is a ferroelectric ceramic material, with a photorefractive effect and piezoelectric properties. It is used in capacitors, electromechanical transducers and nonlinear optics.

Material Notes

Barium Titanate Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. "Elastomer" Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.

Other Information of Barium Titanate Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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