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Titanium Carbide Sputtering Targets (TiC)

Titanium Carbide Sputtering Targets (TiC)
Material Type Titanium Carbide
Symbol TiC
Melting Point (°C) 3,140
Theoretical Density (g/cc) 4.93
Z Ratio 1.00
Sputter RF
Max Power Density*
(Watts/Square Inch)
20
Type of Bond Indium, Elastomer

General

Titanium carbide, TiC, is an extremely hard (Mohs 9–9.5) refractory ceramic material, similar to tungsten carbide. It has the appearance of black powder with the sodium chloride (face-centered cubic) crystal structure.  Titanium carbide is used in preparation of cermets, which are frequently used to machine steel materials at high cutting speed. It is also used as an abrasion-resistant surface coating on metal parts, such as tool bits and watch mechanisms. Titanium carbide is also used as a heat shield coating for atmospheric reentry of spacecraft.

Material Notes

Titanium Carbide Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
 



Other Information of Titanium Carbide Sputtering Targets
 

Applications
  PVD and CVD display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

 

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 

 

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