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AEM Deposition

Zirconium Carbide Sputtering Targets (ZrC)

Zirconium Carbide Sputtering Targets (ZrC)
Zirconium Carbide Sputtering Targets (ZrC)Zirconium Carbide Sputtering Targets (ZrC)Zirconium Carbide Sputtering Targets (ZrC)Zirconium Carbide Sputtering Targets (ZrC)Zirconium Carbide Sputtering Targets (ZrC)
Material Type Zirconium Carbide
Symbol ZrC
Melting Point (°C) 3,540
Theoretical Density (g/cc) 6.73
Z Ratio 0.264
Sputter RF
Type of Bond Indium, Elastomer
Export Control (ECCN) 1C234

Zirconium Carbide Sputtering Target

Zirconium carbide (ZrC) is an extremely hard refractory ceramic material, commercially used in tool bits for cutting tools. It is usually processed by sintering. Zirconium carbide (ZrC) films were prepared by using two Ar+ beams to sputter a zirconium target and a graphite target separately, and a third Ar+ beam to simultaneously bombard the growing flim.

Zirconium Carbide Sputtering Target Information

Zirconium Carbide Sputtering Target
Purity is 99.5%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.

Other Information of Zirconium Carbide Sputtering Target


•  PVD and CVD display
• Semiconductor

• Optical


• High purity
• Custom Sizes Available

Manufacturing Process

• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment


• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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