Zirconium Carbide Sputtering Targets (ZrC)

Home > Sputtering Targets > Carbide Targets > Zirconium Carbide Sputtering Targets (ZrC)

Zirconium Carbide Sputtering Targets (ZrC)

Material Type	Zirconium Carbide
Symbol	ZrC
Melting Point (°C)	3,540

Theoretical Density (g/cc)	6.73
Z Ratio	0.264
Sputter	RF
Type of Bond	Indium, Elastomer
Export Control (ECCN)	1C234

General

Zirconium carbide (ZrC) is an extremely hard refractory ceramic material, commercially used in tool bits for cutting tools. It is usually processed by sintering.

Zirconium

carbide

(ZrC)

films

were prepared by using two Ar+ beams to sputter a zirconium target and a graphite target separately, and a third Ar+ beam to simultaneously bombard the growing flim.

{Ar}^{+}

{Ar}^{+}

Material Notes

Zirconium Carbide Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.

Other Information of Zirconium Carbide Sputtering Targets

Applications
• PVD and CVD display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations