Zirconium Carbide Sputtering Targets (ZrC)



Material Type | Zirconium Carbide |
Symbol | ZrC |
Melting Point (°C) | 3,540 |
Theoretical Density (g/cc) | 6.73 |
Z Ratio | 0.264 |
Sputter | RF |
Type of Bond | Indium, Elastomer |
Export Control (ECCN) | 1C234 |
General
Material Notes
Zirconium Carbide Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
Other Information of Zirconium Carbide Sputtering Targets
Applications • PVD and CVD display • Semiconductor • Optical |
Features • High purity • Custom Sizes Available |
Manufacturing Process • Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options • 99% Minimum Purity • Up to 12'' Diameter Targets Available • Planar Tiles Up to 8'' X 5'' for Larger Target Configurations |


