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Tungsten Carbide Sputtering Targets (WC)

Tungsten Carbide Sputtering Targets (WC)
Material Type Tungsten Carbide
Symbol WC
Melting Point (°C) 2,860
Theoretical Density (g/cc) 15.63
Z Ratio 0.151
Sputter RF
Max Power Density*
(Watts/Square Inch)
20
Type of Bond Indium, Elastomer

General

Tungsten carbide (chemical formula: WC) is a chemical compound (specifically, a carbide) containing equal parts of tungsten and carbon atoms. In its most basic form, tungsten carbide is a fine gray powder, but it can be pressed and formed into shapes for use in industrial machinery, cutting tools, abrasives, armor-piercing rounds, other tools and instruments, and jewelry. Tungsten carbide (WC) is used for the production of DLC coatings (Diamond Like Carbon). 

Material Notes

Tungsten Carbide Sputtering Target, Purity is 99.95%;  Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.

 



Other Information of Tungsten Carbide Sputtering Targets

Applications
  PVD and CVD display
• Semiconductor

• Optical

Features
• High purity
• Custom Sizes Available

 

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
• 99.9% Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 

 

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