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AEM Deposition

Aluminum Neodymium Sputtering Targets (Al/Nd)

Aluminum Neodymium Sputtering Targets (Al/Nd)
Aluminum Neodymium Sputtering Targets (Al/Nd)

Aluminum Neodymium Sputtering Target

AEM Deposition specializes in producing high purity Aluminum Neodymium (Al/Nd) Sputtering Targets with the highest possible density. High Purity (99.9%) Aluminum Neodymium Sputtering Targets with smallest possible average grain sizes can be used for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Aluminum Neodymium Sputtering Target Information

Aluminum Neodymium Sputtering Targets
Purity:99.9%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 

Other Information of Aluminum Neodymium Sputtering Target


Applications
• Semiconductor
• Chemical vapor deposition (CVD)
• Physical vapor deposition (PVD) display
Features
• Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade
Manufacturing Process
• Refining
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
Options
• 99.9% minimum purity
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service

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