Aluminum Oxide Sputtering Target
Aluminium oxide (British English) or aluminum oxide (American English) is a chemical compound of aluminium and oxygen with the chemical formula Al2O3. It is the most commonly occurring of several aluminium oxides, and specifically identified as aluminium(III) oxide. It is commonly called alumina, and may also be called aloxide, aloxite, or alundum depending on particular forms or applications. It occurs naturally in its crystalline polymorphic phase ?-Al2O3 as the mineral corundum, varieties of which form the precious gemstones ruby and sapphire. Al2O3 is significant in its use to produce aluminium metal, as an abrasive owing to its hardness, and as a refractory material owing to its high melting point.
Aluminum Oxide Sputtering Target Information
Aluminum Oxide Sputtering Targets
Purity is 99.9%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
"Elastomer" Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.
We also have high quality pure aluminum sputtering targets with 99.99-99.999% purity for sale.
Other Information of Aluminum Oxide Sputtering Target
• Gate Dielectric
• For CMOS
• Non-volatile Memory
• Thin film capacitor
• High purity
• Custom Sizes Available
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment
• 99.9% ex Strontium Minimum Purity
•Up to 12'' Diameter Targets Available
•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations
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