Aluminum sputtering target is a popular material because it can be easily deposited onto a wide range of substrates, including glass, silicon, and metals. When sputter-deposited, aluminum forms a smooth, hard coating that is highly resistant to corrosion and wear. Additionally, aluminum coatings are often used to improve the appearance of objects by providing a shiny, reflective surface.
In addition to its superior properties, aluminum is also less expensive compared to other sputtering target materials. For these reasons, aluminum sputtering target are widely used in many applications.
Aluminum is a metallic material that is silver-white in color. It can be found in kitchen utensils, cars, streetlights, and aluminum foil on food packaging. Although it is not very strong, it is a good conductor of heat and electricity.
If evaporated in a vacuum, aluminum forms a reflective coating that is used on telescopes, automotive headlamps, mirrors, and toys. The aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in the semiconductor chip, flat panel display, and solar cell industries.
Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils, cars, street lights, and aluminum foil in food packaging. Although it is not a strong material, it is a good conductor of heat and electricity and can form an oxide layer resistant to corrosion. If evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. The aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in the semiconductor chip, flat panel display, and solar cell industries.
AEM Deposition's high purity aluminum sputtering targets make your films possess an outstanding electrical conductivity level and minimize particle formation during the PVD process. We usually use two analytical methods to test our products:
• Competitive pricing
• High purity
• Grain refined, Engineered microstructure
( the average grain size < 300 um)
• Semiconductor grade
• Melting, Zone melting
• Analysis GDMS,ICP-OES
• Analysis Casting & Grain refinement
• Cleaning and final packaging-Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment
• 99.99% minimum purity
• Aluminum alloys sputtering targets
Al2O3, Ni/Cr/Al/Si, Al/Nd, Y3Al5O12, In2O3/Al2O3/ZnO, Al/Si/Cu,
Al/Cu, CuAlO2, AlN, Ni3/Al, Fe/Al, Al/Sc
• Smaller sizes also available for R&D applications
• Sputtering target bonding service