Thin Film Substrate
Aluminum Sputtering Targets (Al)
|Thermal Conductivity||235 W/m.K|
|Melting Point (°C)||660|
|Coefficient of Thermal Expansion||23.1 x 10-6/K|
|Theoretical Density (g/cc)||2.7|
Max Power Density*
|Type of Bond||Indium, Elastomer|
|Comments||Alloys W/Mo/Ta. Flash evap or use BN crucible.|
General of Aluminum
Material Notes of Aluminum Sputtering Targets
Target type: Planar & Rotary sputtering targets
Circular: Diameter <= 16inch, Thickness >= 1mm;
Block: Length <= 48inch, Width <= 15.75inch, Thickness >= 1mm.
Analysis of Aluminum Sputtering Targets
AEM Deposition high purity Aluminum sputtering tragets,which makes your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. And we usually use two Analytical methods to test our products:
1. Metallic elements were analyzed using GDMS.
2. Gas elements were analyzed using LECO.