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Aluminum Sputtering Targets (Al)

Aluminum Sputtering Targets (Al)
Material Type Aluminum
Symbol Al
Atomic Weight 26.9815386
Atomic Number 13
Color/Appearance Silvery, Metallic
Thermal Conductivity 235 W/m.K
Melting Point (°C) 660
Coefficient of Thermal Expansion 23.1 x 10-6/K
Theoretical Density (g/cc) 2.7
Z Ratio 1.08
Sputter DC
Max Power Density*
(Watts/Square Inch)
150
Type of Bond Indium, Elastomer
Comments Alloys W/Mo/Ta. Flash evap or use BN crucible.

General of Aluminum

Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils, cars, street lights, and the popular aluminum foil food packaging. Although it is not a strong material, it is a good conductor of heat and electricity and is able to form an oxide layer that is resistant to corrosion.  When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. Aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in semiconductor chip, flat panel display, solar cell industries.

Material Notes of Aluminum Sputtering Targets

Purity: 99.99-99.9995%;
Target type: Planar & Rotary sputtering targets
Circular: Diameter <= 16inch, Thickness >= 1mm;
Block: Length <= 48inch, Width <= 15.75inch, Thickness >= 1mm. 

Analysis of Aluminum Sputtering Targets

AEM Deposition high purity Aluminum sputtering tragets,which makes your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. And we usually use two Analytical methods to test our products:
1. Metallic elements were analyzed using GDMS.
2. Gas elements were analyzed using LECO.

Other Infomation of Aluminum Sputtering Targets

Applications
 Electronics
• Semiconductor
• Flat panel displays
Features
• Competitive pricing
• High purity
• Grain refined, engineered microstructure ( the average grain size < 300 um)
• Semiconductor grade

Manufacturing Process
• Melting 
  zone melting
• Analysis
  GDMS,ICP-OES
• Analysis
  Casting & Grain refinement
• Cleaning and final packaging-Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
Options
99.99% minimum purity 

• Aluminum alloys sputtering targets
Al2O3, Ni/Cr/Al/Si, Al/Nd, Y3Al5O12, In2O3/Al2O3/ZnO, Al/Si/Cu, Al/Cu, CuAlO2, AlN, Ni3/Al, Fe/Al, Al/Sc

• Smaller sizes also available for R&D applications

• Sputtering target bonding service
 


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