High Purity Materials
Thin Film Substrates
Aluminum Sputtering Targets (Al)
|Thermal Conductivity||235 W/m.K|
|Melting Point (°C)||660|
|Coefficient of Thermal Expansion||23.1 x 10-6/K|
|Theoretical Density (g/cc)||2.7|
Max Power Density*
|Type of Bond||Indium, Elastomer|
|Comments||Alloys W/Mo/Ta. Flash evap or use BN crucible.|
What is Aluminum Sputtering Target
Aluminum sputtering target is a popular material because it can be easily deposited onto a wide range of substrates, including glass, silicon, and metals. When sputter-deposited, aluminum forms a smooth, hard coating that is highly resistant to corrosion and wear. Additionally, aluminum coatings are often used to improve the appearance of objects by providing a shiny, reflective surface.
In addition to its superior properties, aluminum is also less expensive compared to other sputtering target materials. For these reasons, aluminum sputtering target are widely used in many applications.
Aluminum is a metallic material that is silver-white in color. It can be found in kitchen utensils, cars, streetlights, and aluminum foil on food packaging. Although it is not very strong, it is a good conductor of heat and electricity.
If evaporated in a vacuum, aluminum forms a reflective coating that is used on telescopes, automotive headlamps, mirrors, and toys. The aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in the semiconductor chip, flat panel display, and solar cell industries.
Aluminum Sputtering Targets Specification
Target Type: Planar & Rotary sputtering targets
Circular: Diameter <= 16 inch, Thickness >= 1mm;
Block: Length <= 48 inch, Width <= 15.75 inch, Thickness >= 1mm.
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Aluminum Sputtering Targets Analysis
More Information on Aluminum Sputtering Targets
• Flat panel displays
• Competitive pricing
• High purity
• Grain refined, Engineered microstructure
( the average grain size < 300 um)
• Semiconductor grade
• Melting, Zone melting
• Analysis GDMS,ICP-OES
• Analysis Casting & Grain refinement
• Cleaning and final packaging-Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment
• 99.99% minimum purity
• Aluminum alloys sputtering targets
Al2O3, Ni/Cr/Al/Si, Al/Nd, Y3Al5O12, In2O3/Al2O3/ZnO, Al/Si/Cu,
Al/Cu, CuAlO2, AlN, Ni3/Al, Fe/Al, Al/Sc
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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