Aluminum Sputtering Targets (Al)
| Material Type | Aluminum |
| Symbol | Al |
| Atomic Weight | 26.9815386 |
| Atomic Number | 13 |
| Color/Appearance | Silvery, Metallic |
| Thermal Conductivity | 235 W/m.K |
| Melting Point (°C) | 660 |
| Coefficient of Thermal Expansion | 23.1 x 10-6/K |
| Theoretical Density (g/cc) | 2.7 |
| Z Ratio | 1.08 |
| Sputter | DC |
|
Max Power Density* (Watts/Square Inch) |
150 |
| Type of Bond | Indium, Elastomer |
| Comments | Alloys W/Mo/Ta. Flash evap or use BN crucible. |
Aluminum Sputtering Targets
Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils, cars, street lights, and aluminum foil in food packaging. Although it is not a strong material, it is a good conductor of heat and electricity and can form an oxide layer resistant to corrosion. If evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. The aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in the semiconductor chip, flat panel display, and solar cell industries.
Aluminum Sputtering Targets Information
Purity: 99.99-99.9995%;
Target Type: Planar & Rotary sputtering targets
Circular: Diameter <= 16 inch, Thickness >= 1mm;
Block: Length <= 48 inch, Width <= 15.75 inch, Thickness >= 1mm.
Aluminum Sputtering Targets Analysis
AEM Deposition's high purity aluminum sputtering targets make your films possess an outstanding electrical conductivity level and minimize particle formation during the PVD process. We usually use two analytical methods to test our products:
1. Metallic elements analyze using GDMS.
2. Gas elements analyze using LECO.
More Information on Aluminum Sputtering Targets
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Applications • Electronics • Semiconductor • Flat panel displays |
Features • Competitive pricing • High purity • Grain refined, Engineered microstructure ( the average grain size < 300 um) • Semiconductor grade |
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Manufacturing Process • Melting, Zone melting • Analysis GDMS,ICP-OES • Analysis Casting & Grain refinement • Cleaning and final packaging-Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options • 99.99% minimum purity • Aluminum alloys sputtering targets Al2O3, Ni/Cr/Al/Si, Al/Nd, Y3Al5O12, In2O3/Al2O3/ZnO, Al/Si/Cu, Al/Cu, CuAlO2, AlN, Ni3/Al, Fe/Al, Al/Sc • Smaller sizes also available for R&D applications • Sputtering target bonding service |
Related Products of Aluminum Sputtering Targets
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Evaporation Materials |
Crucibles Alumina Crucible |
Metal Powders Aluminium Powder |
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