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AEM Deposition

Boron Oxide Sputtering Targets (B2O3)

Boron Oxide Sputtering Targets (B2O3)
Boron Oxide Sputtering Targets (B2O3)
Material Type Boron Oxide
Symbol B2O3
Color/Appearance White Crystalline Solid
Melting Point (°C) 510
Density  2.46 g/cm3
Molecular Weight 69.62
Exact Mass N/A


Boron oxide is one of the oxides of boron. It is white, glassy, and solid, also known as diboron trioxide, formula B2O3. It is almost always found as the vitreous (amorphic) form; however, it can be crystallized after extensive annealing. It is one of the most difficult compounds known to crystallize. 

Material Notes

Boron Oxide Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.


Other Information of Boron Oxide Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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