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Indium Oxide Sputtering Targets (In2O3)

Indium Oxide Sputtering Targets (In2O3)
Material Type Indium (III) Oxide
Symbol In2O3
Color/Appearance Yellow, Crystalline Solid
Melting Point (°C) 850
Theoretical Density (g/cc) 7.18
Z Ratio **1.00
Max Power Density*
(Watts/Square Inch)
20
Type of Bond Indium, Elastomer

General

Indium(III) oxide (In2O3) is a chemical compound, an amphoteric oxide of indium. Highly transparent and conductive In2O3–ZnO films have been prepared by rf magnetron sputtering using targets composed of In2O3 and ZnO. The etching rate of In2O3–ZnO films when using HCl as the etchant could be controlled by the Zncontent in the films.

Material Notes

Indium Oxide Sputtering Targets, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
 



Other Information of Indium Oxide Sputtering Targets

Applications
 Transparent conductive flim
• Battery

• ITO powder

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
99.9% Minimum Purity

• Disc,Plate,Column, Step shape available

• Crystal Particle Size:5~15µm (Observed by SEM)

 
 
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