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Indium Iron Oxide Sputtering Targets (InFe2O4)

Material Type	Indium Iron Oxide
Symbol	InFe₂O₄
Color/Appearance	Dark Red, Solid
Melting Point (°C)	N/A

Relative Density (g/cc)	N/A
Z Ratio	N/A
Sputter	RF, DC
Max Power Density* (Watts/Square Inch)
Type of Bond	Indium, Elastomer
Comments

Indium Iron Oxide Sputtering Target

Indium Iron Oxide Sputtering Targets
Purity is 99.9%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

Other Information of Indium Iron Oxide Sputtering Target

Applications

• Ferroelectric
• Gate Dielectric

• For CMOS

Features

• High purity
• Custom Sizes Available

Manufacturing Process

• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options

• 99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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