Indium Iron Oxide Sputtering Targets (InFe2O4)
| Material Type | Indium Iron Oxide |
| Symbol | InFe2O4 |
| Color/Appearance | Dark Red, Solid |
| Melting Point (°C) | N/A |
| Relative Density (g/cc) | N/A |
| Z Ratio | N/A |
| Sputter | RF, DC |
|
Max Power Density* (Watts/Square Inch) |
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| Type of Bond | Indium, Elastomer |
| Comments |
Indium Iron Oxide Sputtering Target
Indium Iron Oxide Sputtering Targets
Purity is 99.9%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Other Information of Indium Iron Oxide Sputtering Target
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom Sizes Available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options• 99.9% ex Strontium Minimum Purity•Up to 12'' Diameter Targets Available •Planar Tiles Up to 8'' X 5'' for Larger Target Configurations |
Related Products of Indium Iron Oxide Sputtering Target
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Ceramic Sputtering Targets |
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Evaporation Materials |
Crucibles N/A |
Metal Powders |
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