Tin Oxide Sputtering Target
Tin dioxide (tin(IV) oxide), also known as stannic oxide, is the inorganic compound with the formula SnO2. The mineral form of SnO2 is called cassiterite, and this is the main ore of tin. With many other names, this oxide of tin is the most important raw material in tin chemistry. It is a colourless, diamagnetic, amphoteric solid.
Tin Oxide Sputtering Target Information
Tin Dioxide Sputtering Target
Purity is 99.99%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Elastomer Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.
Other Information of Tin Oxide Sputtering Target
• Normal temperature low resistance
• High conductivity
• High Density electrode materials
• High purity
• Custom Sizes Available
• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment
• 99.99% Minimum Purity
• Elastomer bonding recommended
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