Thin Film Substrate
Tin Sulfide Sputtering Targets (SnS)
|Material Type||Tin Sulfide|
|Color/Appearance||Dark grey, Solid|
|Melting Point (°C)||882|
|Theoretical Density (g/cc)||5.22|
|Sputter||RF, RF-R, DC|
|Type of Bond||Indium, Elastomer|
Tin(II) Sulfide Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 1.4m( by several pieces construction), Width <= 12inch, Thickness >= 1mm. Sulfide sputter target such as Tin Sulfide (SnS) is commonly used in electronic industries and produced by hot press technique.
Analysis of Tin (II) Sulfide Sputtering Targets
AEM Deposition manufacture Tin(II) Sulfide sputtering targets with high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. The analytical methods we use includes:
1. Metallic elements were analyzed using ICP-OES.
2. Gas elements were analyzed using LECO.
Below form is a Certificate of Analysis (COA) for 99.99% high purity Tin (II) Sulfide Sputtering Target:
Other Information of Tin Sulfide Sputtering Targets
• PVD and CVD display
• Optical, solar cell
• High purity
• Custom Sizes Available
• Manufacturing - Hot pressed - Sintered, bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum
• 99.99% Minimum Purity
• Indium and Elastomer bonding service