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Manganese Sputtering Targets (Mn)

Manganese Sputtering Targets (Mn)
Material Type Manganese
Symbol Mn
Atomic Weight 54.938045
Atomic Number 25
Color/Appearance Silvery Metallic
Thermal Conductivity 7.8 W/m.K
Melting Point (°C) 1,244
Coefficient of Thermal Expansion 21.7 x 10-6/K
Theoretical Density (g/cc) 7.2
Z Ratio 0.377
Sputter DC
Max Power Density*
(Watts/Square Inch)
20
Type of Bond Elastomer

General

Manganese is a chemical element with symbol Mn and atomic number 25. It is not found as a free element in nature; it is often found in minerals in combination with iron. Manganese is a metal with important industrial metal alloy uses, particularly in stainless steels. Manganese is a silvery-gray metal that resembles iron. It is hard and very brittle, difficult to fuse, but easy to oxidize.Manganese metal and its common ions are paramagnetic.Manganese tarnishes slowly in air and oxidizes ("rusts") like iron in water containing dissolved oxygen.

Material Notes

Manganese Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
 


Other Information of Manganese Sputtering Targets

Applications
Electronics
• Semiconductor
• Flat panel displays
Features
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade

Manufacturing Process
Refining
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
Options
99.999% minimum purity
• Semiconductor grade aluminum alloys available
  Al/Si,Al/Cu,Al/Cu/Si
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
 
 
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