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AEM Deposition

Lanthanum Manganate Sputtering Targets (LaMnO3)

Lanthanum Manganate Sputtering Targets (LaMnO3)
Lanthanum Manganate Sputtering Targets (LaMnO3)
Material Type Lanthanum Manganate
Symbol LaMnO3
Color/Appearance Black, Solid
Melting Point (°C) N/A
Relative Density (g/cc) >90%
Water Solubility Insoluble
Sputter RF, RF-R, DC
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer


Lanthanum Manganate (LaMnO3) exhibits rich and interesting physical properties related to a strong interplay between lattice distortions, transport properties, and magnetic ordering. The LaMnO3 thin films has promising appilcations used for electronic transducers, thin film capacitors, computer memory cells.

Material Notes

Lanthanum Manganate Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness <= 15 mm; Block: Length <= 120 +/-0.1 mm, Width <= 120 +/-0.1 mm,Thickness <= 15 mm.

Other Information of Lanthanum Manganate Sputtering Targets

• Thermal barrier, catalyst
• Superconducting, solid oxide fuel cell

• Super capacitor
• Electromagnetic device

• High purity & Density
• Custom Sizes Available
• Single Phase 


Manufacturing Process
•  In-house powder synthesis, High purity metal oxide precursor materials, High energy mixing, Particle sizing processes
• Multiple step densification, Proprietary processes employed for pressing and sintering
• Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment
 99.9% Minimum Purity

• Custom compositions may be available upon request

• Smaller sizes also available for R&D applications
• Sputtering target bonding service

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