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Manganese Telluride Sputtering Targets (MnTe)

Material Type	Manganese Telluride
Symbol	MnTe
Color/Appearance	Dark Grey, Solid
Melting Point (°C)	N/A

Theoretical Density (g/cc)	6.50
Water Solubility	Insoluble
Sputter	RF, RF-R, DC
Type of Bond	Indium, Elastomer
Comments

Manganese Telluride Sputtering Targets

Manganese telluride is an inorganic compound with the formula MnTe2. It can be produced by the fusion of manganese and tellurium in a vacuum. The oxidation of manganese in the manganese dioxide is about +2, and the tellurium is present as a dimeric anion (Te2(2-)).

Manganese Telluride Sputtering Targets Information

Manganese Telluride Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.

More Information on Manganese Telluride Sputtering Targets

Applications

• Semiconductor
• Chemical Vapor Deposition (CVD)
• Physical Vapor Deposition (PVD)

Features

• Competitive pricing
• High purity
• Grain refined, Engineered microstructure
• Semiconductor grade

Manufacturing Process

• Refining
Three-layer electrolytic process
• Melting and casting
Electrical resistance furnace - Semi-continuous casting
• Grain refinement
Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment

Options

• 99.9% minimum purity

• Smaller sizes also available for R&D applications

• Sputtering target bonding service

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