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Manganese Telluride Sputtering Targets (MnTe)

Manganese Telluride Sputtering Targets (MnTe)
Material Type Manganese Telluride
Symbol MnTe
Color/Appearance Dark Grey, Solid
Melting Point (°C) N/A
Theoretical Density (g/cc) 6.50
Water Solubility Insoluble
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer


Manganese telluride is an inorganic compound with the formula MnTe2. It can be produces by the fusion of manganese and tellurium in a vacuum. The oxidation of manganese in the manganese dioxide is about +2, and the tellurium is present as a dimeric anion (Te2(2-)). 

Material Notes

Manganese Telluride Sputtering Target, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

Other Information of Manganese Telluride Sputtering Targets

• Chemical vapor deposition (CVD)
• Physical vapor deposition (PVD) display

Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade

Manufacturing Process
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment

99.999% minimum purity
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service



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