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  • List of Sputtering Targets for Shield Coating

    Vacuum sputtering EMI has the characteristics of high conductivity and high electromagnetic shielding efficiency. It can be widely used in the EMI shielding of communication products (mobile phones), computers (laptops), portable electronic products, consumer electronics, network hardware (servers, etc.), medical instruments, home electronic products, aerospace and national defense electronic equipment. At the same time, it is suitable for metal shielding of various plastic products (PC, PC + ABS, ABS, etc.).
     
    Characteristics of sputtering coating for shielding (EMI)
    Shielding (EMI) sputtering coating has the following characteristics:
    1. Low price;
    2. The thickness of the metal film is only 0.5-2 μ m, which does not affect the assembly;
    3. Environmentally friendly process, absolutely environmentally friendly and pollution-free
    4. There is no limit to sputtering materials,
     
    List of sputtering targets for shield coating
    So, what are the sputtering targets that can be used for shield coating? At present, there are copper, chromium, silver, gold, stainless steel, aluminum, silicon dioxide and so on. The details are as follows:
     
    Silver Sputtering Target
    Silver is a soft, lustrous element that belongs to the transition group of metals on the periodic table. It has a melting point of 962 ℃, a density of 10.5 g/cc, and vapor pressure of 10-4 Torr at 1,105 ℃. Silver has been used since ancient times in countless products. It is ductile, malleable, and the most electrically conductive of all metals. It is considered a precious metal and can be found in jewelry, solders, paints, and mirrors. It is evaporated under vacuum for the production of semiconductors, sensors, fuel cells, and optical coatings. 
     
      Name   Silver sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/silver-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99%
      Type   Planar sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Copper Sputtering Target
    Copper is a ductile metal with very high thermal conductivity, electrical conductivity, ductility, corrosion resistance. A freshly exposed surface of pure copper has a reddish-orange color. High-purity copper is used as various wires in the electronics industry, bonding wires for electronic packaging, high-quality audio cables and integrated circuits, liquid crystal display sputtering targets, and ion plating. It is also an indispensable valuable material in atomic energy, rockets, missiles, aviation, space navigation, and metallurgical industries. AEM can provide high purity OFC, Cupronickel and alloy products as you requested.
     
      Name   Copper sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/copper-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99-99.9999%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Aluminum Sputtering Target
    Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils, cars, street lights, and the popular aluminum foil food packaging. Although it is not a strong material, it is a good conductor of heat and electricity and is able to form an oxide layer that is resistant to corrosion.  When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. Aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in semiconductor chip, flat panel display, solar cell industries.
     
      Name   Aluminum sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/aluminum-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.99-99.9995%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Chromium Sputtering Target
    Chromium is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium sputtering targets are widely used in hardware tool coating, decorative coating and Flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping, ...).The thickness of the film is generally 2~10um, and the film requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion porperty. Now, chromium sputtering targets are common applicated in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
     
      Name   Chromium sputtering target   Product link   https://www.aemdeposition.com/pure-metal-targets/chromium-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.5-99.95%
      Type   Planar sputtering target, Rotary sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    Nickel Chromium Sputtering Target
     
      Name   Nickel chromium sputtering target   Product link   https://www.aemdeposition.com/alloy-targets/nickel-chromium-sputtering-targets.html
      Brand   AEM Deposition   Purity   99.9%
      Type   Planar sputtering target   Size   Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

    These sputtering targets can be used in any room temperature solid conductive metal, organic materials, insulation materials, and the film is compact and uniform, and the film thickness is easy to control; the adhesion is strong, and can be used with a variety of different sputtering materials at the same time to prepare multilayer films.
     
     
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