Alloys with W/Ta/Mo; evolves gas on first heating.
Titanium Sputtering Targets
Titanium is a strong metal with low density that is quite ductile (especially in an oxygen-free environment). The relatively high melting point (more than 1,650℃ or 3,000℉ ) makes it useful as a refractory metal. It is paramagnetic and has relatively low electrical and thermal conductivity. Titanium Sputtering Targets are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. It is one of the core materials for preparing integrated circuits, and purity usually requires over 99.99%. AEM offers Titanium alloy targets such as Tungsten Titanium (W/Ti 90/10 wt%) Sputtering Target, an essential material for the semiconductor and solar industry. The W/Ti sputtering target density can reach over 14.24 g/cm3, and the purity can reach 99.995%.
• Melting (EB-Electron Beam Melting)
• Casting & Grain refinement
Forging, Rolling, Annealing, Micrography, Machining
• Cleaning and final packaging - Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment
• 99.9% minimum purity
• Semiconductor grade titanium alloys available
Ti/Al, W/Ti 90/10 wt%)
• Smaller sizes also available for R&D applications
• Sputtering target bonding service