Nickel Molybdenum Sputtering Targets (Ni/Mo)
Nickel Molybdenum Sputtering Target
Nickel Molybdenum Sputtering Targets
Purity is 99.9%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Other Information of Nickel Molybdenum Sputtering Target
Applications• Semiconductor• Chemical vapor deposition (CVD) • Physical vapor deposition (PVD) display |
Features• Competitive pricing• High purity • Grain refined, engineered microstructure • Semiconductor grade |
Manufacturing Process• RefiningThree-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options• 99.9% minimum purity• Planar circular targets up to 18'' (457mm) diameter • Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations • Smaller sizes also available for R&D applications • Sputtering target bonding service |
Related Products of Nickel Molybdenum Sputtering Target
|
Ceramic Sputtering Targets Molybdenum Oxide Sputtering Target |
||
|
Evaporation Materials Molybdenum Evaporation Pellet |
Crucibles Molybdenum Crucible |
Metal Powders Molybdenum Powder |
Click for a downloadable datasheet on the Nickel Molybdenum Sputtering Targets (Ni/Mo)
Can't find the downloadable datasheet you need? Click here to send email to get it.
Click here for answers to some of the most common questions we get asked.
