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AEM Deposition

Tungsten Oxide Sputtering Targets (WO3)

Tungsten Oxide Sputtering Targets (WO3)
Tungsten Oxide Sputtering Targets (WO3)Tungsten Oxide Sputtering Targets (WO3)Tungsten Oxide Sputtering Targets (WO3)Tungsten Oxide Sputtering Targets (WO3)
Material Type Tungsten Oxide
Symbol WO3
Color/Appearance Lemon Yellow, Solid
Melting Point (°C) 1,473
Theoretical Density (g/cc) 7.16
Z Ratio **1.00
Sputter RF-R
Type of Bond Indium, Elastomer
Comments Preheat gently to outgas. W reduces oxide slightly.


Tungsten(VI) oxide, also known as tungsten trioxide or tungstic anhydride, WO3, is a chemical compound containing oxygen and the transition metal tungsten. It is obtained as an intermediate in the recovery of tungsten from its minerals. Tungsten ores are treated with alkalis to produce WO3. Further reaction with carbon or hydrogen gas reduces tungsten trioxide to the pure metal.

Material Notes

Tungsten Trioxide Sputtering Target, Purity is 99.99%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.


Other Information of Tungsten Oxide Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

• 99.9% ex Strontium Minimum Purity

• Up to 12'' Diameter Targets Available

• Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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