Tungsten Disulfide Sputtering Targets
Tungsten disulfide is the chemical compound with the formula WS2. It occurs naturally as the rare mineral tungstenite. This material is a component of certain catalysts used for hydrodesulfurization and hydrodenitrification.WS2 adopts a layered structure related to MoS2, with W atoms situated in trigonal prismatic coordination sphere. Owing to this layered structure, WS2 forms inorganic nanotubes, which were discovered on an example of WS2 in 1992.
Tungsten Disulfide Sputtering Targets Information
Tungsten Disulfide Sputtering Target,
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 1.4m(by several pieces construction), Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.Tungsten Sulfide (WS2) is commonly used in electronic industries.
More Information on Tungsten Disulfide Sputtering Targets
• Chemical Vapor Deposition (CVD)
• Physical Vapor Deposition (PVD)
• High purity
• Custom Sizes Available
• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment
• 99.8% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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