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AEM Deposition

Tungsten Titanium Sputtering Targets (W90/Ti10)

Tungsten Titanium Sputtering Targets (W90/Ti10)
Tungsten Titanium Sputtering Targets (W90/Ti10)


Material Notes

Tungsten Titanium WTi10 Sputtering Targets, purity 99.9%, 99.95%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

Other Information of Tungsten Titanium Sputtering Targets

• Chemical vapor deposition (CVD)
• Physical vapor deposition (PVD) display
Competitive pricing
• High purity
• Grain refined, engineered microstructure
• Semiconductor grade

Manufacturing Process
  Three-layer electrolytic process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting
• Grain refinement
  Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
99.9%, 99.95%, density >14.24g/cc, 
• Planar circular targets up to 18'' (457mm) diameter
• Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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