Pyrolytic Graphite Sputtering Targets (C)
| Material Type | Pyrolytic Graphite |
| Symbol | C |
| Atomic Weight | 12.0107 |
| Atomic Number | 6 |
| Color/Appearance | Black, Non-Metallic |
| Thermal Conductivity | 140 W/m.K |
| Melting Point (°C) | ~3,652 |
| Coefficient of Thermal Expansion | 7.1 x 10-6/K |
| Theoretical Density (g/cc) | 2.25 |
| Z Ratio | 3.26 |
| Sputter | PDC |
|
Max Power Density* (Watts/Square Inch) |
80 |
| Type of Bond | Indium, Elastomer |
| Comments | E-beam preferred. Arc evaporation. Poor film adhesion. |
Pyrolytic Graphite Sputtering Targets
Comparing with standard carbon graphite targets, the pyrolytic graphite sputtering targets are much more directional and have the ability to sputter at higher rates.The Pyrolytic Graphite targets are made by chemical vapor deposition (CVD) and are grown atom-by-atom, which resulting the material has better thermal, electrical and chemical properties. Due to the nature of the deposition process by CVD, Pyrolytic Graphite material approaches the theoretical density and is essentially non-porous so outgassing occurs quickly.
Pyrolytic Graphite Sputtering Targets Information
Pyrolytic Graphite Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Pyrolytic Graphite Sputtering Targets
Applications• Electronics• Semiconductor • Flat panel displays |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process• RefiningThree-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options• 99.99% minimum purity• Carbide targets Boron Carbide, Hafnium Carbide, Molybdenum Carbide, Niobium Carbide, Silicon Carbide, Tantalum Carbide, Titanium Carbide, Tungsten Carbide, Vanadium Carbide, Zirconium Carbide Sputtering Targets • Sputtering target bonding service |
Related Products of Pyrolytic Graphite Sputtering Targets
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N/A
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Ceramic Sputtering Targets |
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Evaporation Materials N/A |
Crucibles Graphite Crucible |
Metal Powders N/A |
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