List of Sputtering Targets for Tool Coating
Tool coating is often used for turning tools, manipulators, molds and other mechanical and metallurgical purposes. Coating products include drill, milling cutter, gear cutter, tap, scissors, cutter, plug, die, etc. The thickness of the film is generally 2-10 μ M. the film requires high hardness, low wear, impact resistance, high adhesion, etc. its technical level is higher than that of decorative coating. The superhard protective layer of tools and dies, including tin, ZrN, TiAlN, tic, TiCN, CrN, DLC and other Sputtering Coatings.
In order to meet the demand of coating, the demand of sputtering target materials for tool coating becomes more and more vigorous. The sputtering targets
that can be used for tool coating are Ti, Al, Cr, C, Ti / Al and so on. The details are as follows:
Titanium sputtering target
Titanium sputtering targets are common used in hardware tool coating, decorative coating, semicondutor components and Flat display coating. It is one of the core materials for preparing integrated circuits, and the purity usually require over 99.99%. AEM also can provide Titanium alloy targets such as tungsten titanium (W/Ti 90/10 wt%) sputtering target, which is an improtant material for semiconductor and solar industry. The density of W/Ti sputtering target we can reach over 14.24 g/cm3, and the purity can reach to 99.995%.
Aluminum sputtering target
Aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in semiconductor chip, flat panel display, solar cell industries.
Chromium sputtering target
Chromium sputtering targets are widely used in hardware tool coating, decorative coating and Flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping, ...).The thickness of the film is generally 2~10um, and the film requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion porperty. Now, chromium sputtering targets are common applicated in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
Carbon sputtering target
Carbon (from Latin: carbo "coal") is a chemical element with symbol C and atomic number 6. It is nonmetallic and tetravalent—making four electrons available to form covalent chemical bonds. Three isotopes occur naturally, 12C and 13C being stable, while 14C is a radioactive isotope, decaying with a half-life of about 5,730 years. The atoms of carbon can bond together in different ways, termed allotropes of carbon. The best known are graphite, diamond, and amorphous carbon. The physical properties of carbon vary widely with the allotropic form.
Ti Al sputtering target
Avanced Engieering Materials produce Titanium Aluminum sputtering targets by advanced Hot isostatic pressing process. Titanium aluminum sputtering targets are common used in hardware tool coating, decorative coating, semicondutor components and Flat display coating due to the porperity of high ductility (Long service life), high thermal conductivity and Homogeneous microstructure.
Titanium nitride sputtering target
Titanium nitride (TiN) (sometimes known as tinite) is an extremely hard ceramic material, often used as a coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.
Zirconium nitride sputtering target
Zirconium nitride (ZrN) is an inorganic compound used in a variety of ways due to its properties.ZrN grown by physical vapor deposition (PVD) is a light gold color similar to elemental gold. ZrN has a room-temperature electrical resistivity of 12.0 µΩ·cm, a temperature coefficient of resistivity of 5.6·10−8 Ω·cm/K, a superconducting transition temperature of 10.4 K, and a relaxed lattice parameter of 0.4575 nm. The hardness of single-crystal ZrN is 22.7±1.7 GPa and elastic modulus is 450 GPa. Zirconium nitride is a hard ceramic material similar to titanium nitride and is a cement-like refractory material. Thus it is used in refractories, cermets and laboratory crucibles.
Titanium carbide sputtering target
Titanium carbide, TiC, is an extremely hard (Mohs 9–9.5) refractory ceramic material, similar to tungsten carbide. It has the appearance of black powder with the sodium chloride (face-centered cubic) crystal structure. Titanium carbide is used in preparation of cermets, which are frequently used to machine steel materials at high cutting speed. It is also used as an abrasion-resistant surface coating on metal parts, such as tool bits and watch mechanisms. Titanium carbide is also used as a heat shield coating for atmospheric reentry of spacecraft.
Chromium nitride sputtering target
Chromium nitride is a chemical compound of chromium and nitrogen with the formula CrN. It is very hard, and is extremely resistant to corrosion. It is an interstitial compound, with nitrogen atoms occupying the octahedral holes in the chromium lattice, it is not strictly a chromium(III) compound nor does it contain nitride ions (N3-). Chromium forms a second interstitial nitride, dichromium nitride, Cr2N.