Copper Zirconium Sputtering Target (Cu/Zr)
Copper Zirconium Sputtering Targets
Copper zirconium sputtering target is an alloy sputtering target composed of copper and zirconium. It is mainly used in semiconductor, optics, chemical vapor deposition (CVD), physical vapor deposition (PVD) display and other fields.
Copper Zirconium Sputtering Targets Information
Copper Zirconium Sputtering Targets
Purity: 99.95%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
More Information on Copper Zirconium Sputtering Targets
Applications• Semiconductor• Chemical Vapor Deposition (CVD) • Physical Vapor Deposition (PVD) • Optical applications |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process• RefiningThree-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options• 99.95% minimum purity• Smaller sizes also available for R&D applications • Sputtering target bonding service |
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