List of Sputtering Targets for Low Radiation Building Glass
Low-E (low radiation coated glass) building glass, which is coated with silver film or fluorine doped tin oxide film on the surface of the glass, uses the film to reflect far infrared rays, to achieve the purpose of heat insulation and heat preservation. Low radiation building glass has the effects of high visible light transmittance (natural lighting), low reflection (low light pollution), low ultraviolet and near infrared transmittance (shading).
Vacuum magnetron sputtering coating
Low-E coated hollow glass has the lowest radiation rate (0.08 ~ 0.15), which can effectively reduce the loss of indoor heat energy, so it is the best lighting energy-saving system. The sputtering targets for coating are mainly large plane targets and spray / cast rotating targets.
List of sputtering targets for low radiation building glass
There are many sputtering targets
that can be used for architectural glass coating, such as Ag, Ni / Cr, Sn (SnO2 film), Ti / TiO2 (TiO2 film), Zn (ZnO film), Si / SiAl (SiN film), ZnAl, ZnSn, ZnSnSb, Cr, Nb, Nb2O5 and other sputtering targets, as follows:
Silver Sputtering Target
Silver is a soft, lustrous element that belongs to the transition group of metals on the periodic table. It has a melting point of 962 ℃, a density of 10.5 g/cc, and vapor pressure of 10-4 Torr at 1,105 ℃. Silver has been used since ancient times in countless products. It is ductile, malleable, and the most electrically conductive of all metals. It is considered a precious metal and can be found in jewelry, solders, paints, and mirrors. It is evaporated under vacuum for the production of semiconductors, sensors, fuel cells, and optical coatings.
Tin Sputtering Target
Tin is a soft, malleable, ductile and highly crystalline silvery-white metal. When a bar of tin is bent, a crackling sound known as the "tin cry" can be heard from the twinning of the crystals. Tin melts at the low temperature of about 232 ℃(450 ℉), the lowest in group 14. The melting point is further lowered to 177.3 ℃(351.1 ℉) for 11 nm par.
Titanium Sputtering Target
Titanium sputtering targets are common used in hardware tool coating, decorative coating, semicondutor components and Flat display coating. It is one of the core materials for preparing integrated circuits, and the purity usually require over 99.99%. AEM also can provide Titanium alloy targets such as tungsten titanium (W/Ti 90/10 wt%) sputtering target, which is an improtant material for semiconductor and solar industry. The density of W/Ti sputtering target we can reach over 14.24 g/cm3, and the purity can reach to 99.995%.
Zinc Sputtering Target
Zinc is a bluish-white, lustrous, diamagnetic metal, though most common commercial grades of the metal have a dull finish. It is somewhat less dense than iron and has a hexagonal crystal structure, with a distorted form of hexagonal close packing, in which each atom has six nearest neighbors (at 265.9 pm) in its own plane and six others at a greater distance of 290.6 pm. The metal is hard and brittle at most temperatures but becomes malleable between 100 and 150 ℃. Above 210 ℃, the metal becomes brittle again and can be pulverized by beating. Zinc is a fair conductor of electricity. For a metal, zinc has relatively low melting (419.5 ℃) and boiling points (90).
Silicon Sputtering Target
With a relatively high thermal conductivity of 149 W•m-1•K-1, silicon conducts heat well. Silicon sputtering target mainly used in in reactive magnetron sputtering to deposit dielectric layers such as SiO2 and SiN. As an important functional film material, they have good hardness, optical, dielectric properties and wear resistance. The corrosion resistance of Si targets have broad application prospects in optical and microelectronics fields, and are currently widely used as functional materials in the world. Currently, it mainly used for LCD transparent conductive glass, architectural LOW-E glass and microelectronics industry. The silicon sputtering targets can be divided into two types: single crystal and polycrystalline. We produce planar silicon sputtering targets through Czochralski crystal growth method.
Chromium Sputtering Target
Chromium sputtering targets are widely used in hardware tool coating, decorative coating and Flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping, ...).The thickness of the film is generally 2~10um, and the film requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion porperty. Now, chromium sputtering targets are common applicated in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
Niobium Sputtering Target
Niobium is a lustrous, grey, ductile, paramagnetic metal in group 5 of the periodic table (see table), with an electron configuration in the outermost shells atypical for group 5. (This can be observed in the neighborhood of ruthenium (44), rhodium (45), and palladium (46).)Although it is thought to have a body-centered cubic Crystal structure from T = 0 K to its melting point, high-resolution measurements of the thermal expansion along the three crystallographic axes reveal anisotropies which are inconsistent with a cubic structure. Therefore, further research and discovery in this area is expected.
Nickel Chromium Sputtering Target
Zinc Tin Sputtering Target
The research describe the electrolytic deposition of Zn, Sn and Zn/Sn alloys from a solution of the metal chloride salts separately in urea and ethylene glycol/choline chloride based ionic liquids. It shows that the deposition kinetics and thermodynamics differ from the aqueous processes and that qualitatively different phases, compositions and morphologies are obtained for the metal coatings in the different ionic liquid systems.
Niobium Oxide Sputtering Target
Niobium pentoxide is the inorganic compound with the formula Nb2O5. It is a colourless insoluble solid that is fairly unreactive. It is the main precursor to all materials made of niobium, the dominant application being alloys, but other specialized applications include capacitors, lithium niobate, and optical glasses.
AEM Deposition can provide customers with sputtering targets of different specifications and materials, with purity requirements ranging from 99% to 99.9%, which can be applied to various coating systems. Interested friends can directly click the relevant links to enter the corresponding product page. You can also send us email for consultation directly. E-mail: [email protected]