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AEM Deposition

Iron Oxide Sputtering Targets (Fe2O3)

Iron Oxide Sputtering Targets (Fe2O3)
Iron Oxide Sputtering Targets (Fe2O3)
Material Type Iron (III) Oxide
Symbol Fe2O3
Color/Appearance Red-Brown, Crystalline Solid
Melting Point (°C) 1,565
Theoretical Density (g/cc) 5.24
Z Ratio **1.00
Sputter RF, RF-R
Max Power Density*
(Watts/Square Inch)
Type of Bond Indium, Elastomer
Comments Disproportionate to Fe3O4 at 1,530°C.


Iron oxides are chemical compounds composed of iron and oxygen. All together, there are sixteen known iron oxides and oxyhydroxides.Iron oxides and oxide-hydroxides are widespread in nature, play an important role in many geological and biological processes, and are widely used by humans, e.g., as iron ores, pigments, catalysts, in thermite (see the diagram) and hemoglobin. Common rust is a form of iron(III) oxide.

Material Notes

Iron Oxide Sputtering Targets, Purity is 99.5% - 99.9%;Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.

Other Information of Iron Oxide Sputtering Targets

• Gate Dielectric

• For CMOS

• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

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