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Iron Sputtering Targets (Fe)

Iron Sputtering Targets (Fe)
Material Type Iron
Symbol Fe
Atomic Weight 55.845
Atomic Number 26
Color/Appearance Lustrous, Metallic, Grayish Tinge
Thermal Conductivity 80 W/m.K
Melting Point (°C) 1,535
Coefficient of Thermal Expansion 11.8 x 10-6/K
Theoretical Density (g/cc) 7.86
Ferromagnetic Magnetic Material
Z Ratio 0.349
Sputter DC
Max Power Density*
(Watts/Square Inch)
50
Comments Attacks W. Films hard, smooth. Preheat gently to outgas.

General

Iron is a metal in the first transition series. Iron sputtering target belongs to ferromagnetic target and are often used in information stroage industry. The alloy sputtering targets are widely used for magnetic recording. Iron can be combined with some rare earth metals to form migrating rare earth metal sputtering targets, such as Tb-Fe-Co, Nd-Dy-Fe-Co, Ga-Tb-Fe-Co. Those sputtering targets are commonly applicated as optcial disc materials.

Material Notes

Purity: 99.9-99.99%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target


Other Information of Iron Sputtering Targets

Applications
Electronics
• Information storage industry
• Flat panel displays
Features
Competitive pricing
• High purity
• Grain refined, engineered microstructure
(average grain size< 100 um)
• Semiconductor grade

Manufacturing Process
• Melting and casting
  Electrical resistance furnace - Semi-continuous casting (VIM)

• Analysis (GDMS, ICP-OES, LECO)
• Grain refinement
  Thermomechanical treatment 
(Forging, Rolling, Annealing)
• Cleaning and final packaging - Cleaned for use in vacuum
  Protection from environmental contaminants
  Protection during shipment
Options
99.9% minimum purity
• Semiconductor grade Iron alloys available
  Co-Fe, Ni/Fe, Fe/Si, Fe/Al
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
 
 
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