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Lanthanum Ferrite Sputtering Targets (LaFeO3)

Lanthanum Ferrite Sputtering Targets (LaFeO3)
Material Type Lanthanum Ferrite
Symbol LaFeO3
Color/Appearance Various colors, Solid
Melting Point (°C) 977
Relative Density (g/cc) >90%
Z Ratio N/A
Sputter RF, RF-R, DC
Max Power Density*
(Watts/Square Inch)
N/A
Type of Bond Indium, Elastomer
Comments  

General

 

Material Notes

Lanthanum Ferrite Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.
 


Other Information of Lanthanum Ferrite Sputtering Targets

Applications
  Ferroelectric
• Gate Dielectric

• For CMOS

Features
• High purity
• Custom Sizes Available

Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate

• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment

Options
99.9% ex Strontium Minimum Purity

•Up to 12'' Diameter Targets Available

•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations

 
 
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